Photolithography and sample preparation
Ultraviolet Ozone Cleaning System - UVOCS T10x10/OES
The UVOCS T10x10/OES Ultraviolet Ozone Cleaning System provides a simple, inexpensive and fast method of obtaining ultra-clean surfaces free of organic contaminants. This process is ideal when thin film deposition with excellent adhesion to the surface is required. Ultra-clean surfaces can easily be achieved by UV/Ozone processing in one to several minutes after the surface has been cleaned by conventional techniques.
Location
Electrical Engineering Cleanroom
Davis Hall, Suite 114
University at Buffalo North Campus
Buffalo, NY 14260
Fees
- Internal Academic: $25
- External Academic: $25
- Industry: $100
Ultraviolet Ozone Cleaning System - UVOCS T10x10/OES
For general inquiries, contact:
Donald J. Goralski
Director, Shared Instrumentation Laboratories
(716) 645-5151
For technical inquiries, contact:
Jeff Salzmann
Assistant Professor of Research, Cleanroom Manager
(716) 645-2584