Deposition
Sputtering Deposition System - Kurt J. Lesker Company® PRO Line PVD 75
The Kurt J. Lesker Company® PRO Line PVD 75 is the next generation thin film deposition system based on the workhorse PVD 75 platform.
With more than 400 units in service worldwide, the PVD 75 is a proven, robust, and versatile design. The PRO Line PVD 75 builds on the successes of the original design with improved system base pressures and pump down times. A technically superior chamber design, an industry best software control system with advanced programming capability, automatic substrate loading, and numerous features for optimized thin film performance are a few of the key advantages offered in this innovative, best of class design.
Features:
- 2” target DC and RF sputter deposition system
- Load lock for fast sample loading
- 5 Heads (2 are high magnetic strength for magnetic materials)
- 2 DC power supplies, 1 RF power supply
- Co-sputtering or up to 3 materials
- Heated sample holder (up to 350 C)
- 3 gas channels to allow reactive sputtering
Location
Electrical Engineering Cleanroom
Davis Hall, Suite 114
University at Buffalo North Campus
Buffalo, NY 14260
Fees
- Internal Academic: $25
- External Academic: $25
- Industry: $100
For general inquiries, contact:
Donald J. Goralski
Director, Shared Instrumentation Laboratories
(716) 645-5151
For technical inquiries, contact:
Jeff Salzmann
Assistant Professor of Research, Cleanroom Manager
(716) 645-2584