Chemicals provided by the Shared Instrumentation Laboratories

50 PMMA A-9 (positive polymer)
950 PMMA A-5 (positive polymer)
950 PMMA A-4 (positive polymer)
950 PMMA A-2 (positive polymer)
495 PMMA A-4 (positive polymer)
Copolymer EL9 in anisole (EL9 MMA 8.5)
A2 300 MF Developer
Ammonium hydroxide (NH₄OH)
Hexamethyldisilazane, 98% ( N₂ flushed)
LOR -1A (Lift off Resist positive polymer)
LOR -3B (Lift off Resist)
LOR -10B (Lift off Resist)
MF-26A (TMAH based developer)
MIBK/IPA 1:3 Developer
P-20 primer
Remover PG
S1805 (Microposit, positive photoresist)
S1813 (Microposit, positive photoresist)
S1818 (Microposit, positive photoresist)
KL 1607 (positive photoresist)
MF-319 (TMAH based developer for S1818)
1165 (Stripper for S1818 and PMMA)
Kemlabs, HARE SQ-5 (negative resist)
Kemlabs, HARE SQ-10 (negative resist)
Kemlabs, HARE SQ-50 (negative resist)
Kemlabs, HARE SQ Developer

SU-8 2010 (negative resist)
SU-8 2015 (negative resist)
SU-8 2050 (negative resist)
SU-8 2100 (negative resist)
SU-8 Developer
PMGI SF-10
OmniCoat
Tetrahydrofuran, T425-1
Chloroform
Tetraethoxysilane, 99.9% (TEOS)
H₂O₂ (Hydrogen Peroxide)
Acetone, electronic grade
Methanol, electronic grade
Ethanol (ethyl alcohol)
Isopropyl alcohol, 99.5%, electronic grade
Trichloroethylene, electronic grade 99.5+%
Oxygen gas
Argon gas
Nitrogen gas
Helium gas
CDA (Clean dry air)
RODI water
BCl₃ Gas (Boron Trichloride)
Cl₂ Gas (Chlorine)
CF₄ gas (Tetrafluoromethane)
Forming gas 5%H₂/95%Ar

Acetone
Methanol
Isopropyl alcohol, 70%
Chloroform

Argon gas
Nitrogen gas
Helium gas
CDA (Clean dry air)
RODI water